Hybrid silicon laser-quantum well intermixing wafer bonded integration platform for advanced photonic circuits with electroabsorption modulators

ABSTRACT

Photonic integrated circuits on silicon are disclosed. By bonding a wafer of compound semiconductor material as an active region to silicon and removing the substrate, the lasers, amplifiers, modulators, and other devices can be processed using standard photolithographic techniques on the silicon substrate. A silicon laser intermixed integrated device in accordance with one or more embodiments of the present invention comprises a silicon-on-insulator substrate, comprising at least one waveguide in a top surface, and a compound semiconductor substrate comprising a gain layer, the compound semiconductor substrate being subjected to a quantum well intermixing process, wherein the upper surface of the compound semiconductor substrate is bonded to the top surface of the silicon-on-insulator substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of co-pending U.S. patent application Ser. No. 12/355,628, filed Jan. 16, 2009, which claims the benefit under 35 U.S.C. §119(e) of U.S. Application Ser. No. 61/022,239, filed on Jan. 18, 2008, by Matthew N. Sysak et al., entitled “HYBRID SILICON LASER-QUANTUM WELL INTERMIXING WAFER 5 BONDED INTEGRATION PLATFORM FOR ADVANCED PHOTONIC CIRCUITS WITH ELECTROABSORPTION MODULATORS,” which application is incorporated by reference herein. If there are any contradictions or inconsistencies in language between this application and one or more of the cases that have been incorporated by reference that might affect the interpretation of the claims in this case, the claims in this case should be interpreted to be consistent with the language in this case.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

This invention was made with Government support under Grant No. W911NP-06-1-0496 awarded by the U.S. Army and Grant No. FA 8750-05-C-0265 from the U.S. Air Force. The Government has certain rights in this invention.

BACKGROUND OF THE INVENTION Description of the Related Art

Semiconductor chip level bonded devices have found uses in several consumer and commercial applications. Typically, semiconductor devices are made from a single type of material, or different types of material are grown onto a substrate based on lattice matching and compatible crystalline structures. Devices manufactured from III-V materials are typically grown on gallium arsenide or other compound semiconductor substrates. These devices are difficult to integrate with electronic devices fabricated on silicon.

BRIEF DESCRIPTION OF THE DRAWINGS

Referring now to the drawings in which like reference numbers represent corresponding parts throughout:

FIG. 1 is a cross-sectional view of a InGaAsP/InP base structure for the SL-QWI integration platform of the present invention;

FIG. 2 is a cross-sectional view of the SOI wafer base structure for the SL-QWI integration platform of the present invention;

FIG. 3 illustrates the pre-bond process steps for the SOI wafer of FIG. 2, showing a top view of the unpatterned SOI wafer, a top view of the patterned SOI wafer, and a cross section of the shallow etched SOI waveguide in accordance with the present invention;

FIGS. 4A and 4B illustrate the process steps for the InGaAsP/InP wafer before plasma assisted wafer bonding. FIG. 4A illustrates the quantum well intermixing process and FIG. 4B illustrates the holographic grating process in accordance with the present invention;

FIG. 5 illustrates a cross sectional view of various regions in a tunable transmitter throughout post-bond III-V processing in accordance with the present invention;

FIG. 6 illustrates a tunable transmitter including a Widely Tunable Sampled Grating DBR laser, semiconductor optical amplifier, and electroabsorption modulator in accordance with the present invention;

FIG. 7 illustrates a top view and a cross sectional view of an integrated pre-amplified receiver in accordance with the present invention;

FIG. 8 illustrates a top view and a cross sectional view of an integrated photocurrent driven wavelength converter in accordance with the present invention;

FIG. 9 illustrates a waveguide layer in the material instead of in the silicon layer in accordance with the present invention;

FIG. 10 illustrates a III-V waveguide layer placed between the silicon layer and the quantum well gain region in accordance with the present invention;

FIG. 11 illustrates a waveguiding layer above the quantum well layer after the etching of the quantum wells for the passive regions in accordance with the present invention;

FIG. 12 illustrates a quantum well intermix of the regions where passive waveguides are desired in accordance with the present invention;

FIG. 13 illustrates the lateral confinement of the mode coming from patterning the silicon layer, patterning the III-V layers, or both, in accordance with the present invention; and

FIG. 14 illustrates a process chart in accordance with one or more embodiments of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the following description, reference is made to the accompanying drawings which form a part hereof, and which is shown, by way of illustration, several embodiments of the present invention. It is understood that other embodiments may be utilized and structural changes may be made without departing from the scope of the present invention.

Integrating electronic and photonic devices on a single substrate has several potential advantages. Passive photonic devices such as arrayed waveguide routers (AWG) are commonly fabricated on silicon. Some active photonic devices have been demonstrated on silicon such as modulators and Raman lasers. However, most active photonic devices require single crystal material, which is difficult to grow on silicon because of the large lattice mismatch between the semiconductor with the proper bandgaps and silicon itself. The problem with the present discrete photonic devices is that the performance can be improved with integration, and the cost and size is much smaller. Silicon is a preferred semiconductor material, because it is easily processed, it is readily available for reasonable cost and high quality, and complex VLSI electronic circuits are readily available. However, silicon-based modulators or lasers or other photonic devices are not as efficient as their III-V based counterparts. It can be seen, then, that a larger scale integration between III-V materials and silicon may provide cost and efficiency advantages.

Overview

Some embodiments of the invention comprise a novel hybrid Silicon Laser-Quantum Well Intermixing (SL-QWI) integration platform for monolithically integrating InP based photonic devices together with low loss silicon photonics and CMOS electronics. Device fabrication is straightforward and requires only standard lithography techniques in some embodiments.

First, a set of optical waveguides is patterned on a silicon-on-insulator (SOI) wafer. Next, an InGaAsP/InP wafer that includes a set of Quantum Wells (QWs) for optical gain, is subjected to a well-defined quantum well intermixing process. The intermixing process allows the emission was of the QWs to be shifted at various locations on the wafer where passive waveguide regions, mirror regions, modulator regions, or gain regions are desired.

Gratings are then patterned in the mirror regions (wafer top side-opposite substrate) using a well established holographic exposure technique. A shallow etch is used to transfer the holographic exposure pattern to the mirror regions in the top side of the InP wafer. The patterned face of the InP wafer is then wafer bonded to the patterned face of the SOI wafer using a low temperature plasma assisted bonding process.

The bonding requires only coarse rotational alignment to ensure that the pre-patterned gratings are orthogonal to the optical wave aides on the SOI wafer. Following the bonding, the InP substrate is removed and the p-contact and n-contact layers in the InGaAsP/InP are lithographically exposed and metallized. Current injection is used for optical gain in non-intermixed regions, and for index tuning in highly intermixed grating regions. A reverse bias is applied to regions that have been partially intermixed for modulators, and for gain regions that operate as photodiodes. Electrical isolation between gratings, gain regions, photodiodes, and modulators is performed using a proton implant step. By integrating grating sections, optical gain regions, amplifiers, and photodetectors together with electroabsorption modulators, this platform opens the door for a wide variety of photonic integrated circuits, e.g., tunable laser transponders, wavelength converters, tunable lasers, pre-amplified photodetectors, etc., that were previously unavailable using a simple InP-based wafer bonding approach.

This approach for fabrication of advanced photonic integrated circuits can provide a number of unique advantages in various embodiments. The SL-QWI platform may enable a wide range of InP-based functionalities (modulators, lasers, amplifiers) to be preformed in an SOI based platform without discrete laser placement or MOCVD growth. Previous attempts at combining external modulation with Si photonics have required placement of discrete lasers individually. This is very time consuming and translates into high cost in the end product. As an alternative, many photonic integrated circuits are fabricated using InP based substrates where it is straightforward to integrate modulators and laser together. However, these approaches require multiple growth and/or regrowth steps, which have detrimental effects on device yield. Furthermore, InP substrates do not have the mechanical stability that is available for Si based material. Although there have been some reports of modulator effects using strained silicon and SiGe quantum wells, it is not possible to integrate these modulators together with lasers currently in a single integration platform. Furthermore, the modulation effects that were observed in the strained silicon are very weak, or have inherently large insertion loss. The present invention is the first time an integration platform is proposed that can combine integrated, small form factor electroabsorption modulators together with lasers and other InP photonic functionalities in a Si-based integration platform.

Embodiments of the invention comprise a novel Hybrid Silicon Laser-Quantum Well intermixing (SL-QWI) integration platform for photonic circuits used in telecommunications and in chip-to-chip interconnect applications. This integration approach is highly unique because it allows wafer scale fabrication of advanced photonic circuits that require electroabsorption modulators in a silicon photonics integration platform. Previous integration platforms that offered this functionality either required complex growth and/or regrowth steps, or required a hybrid InP-based laser with a Mach-Zehnder Si modulator. Generally, MZI modulators are large, are sensitive to thermal effects, and can consume significant physical space on a Si wafer. Other common alternatives to combining an external modulator and laser source have previously required individual placements of each laser component. This is both time consuming and costly. The SL-QWI platform enables electroabsorption modulators to be fabricated in a wafer-scale process in combination with lasers, amplifiers, and photodetectors.

The Silicon-on-Insulator (SOI) and InP/InGaAsP base structures that are used in the fabrication process are shown in FIGS. 2 and 1, respectively. The SOI wafer (from substrate) comprises a Si substrate followed by a Silicon Dioxide (SiO2) layer and a thin layer of silicon (<1 micron). The InP/InGaAsP base structure (from substrate) is grown by MOCVD on a p-type InP substrate. Above the substrate layer is a 100 nm thick p-type InGaAs layer that is highly doped followed by a p-type InP cladding layer that is 2 microns thick. Above the cladding layer is a separate confined heterostructure (SCH) layer that is used for carrier confinement in laser and other forward biased regions. Above the SCH layer are a set of quantum wells and barriers that are used for optical gain. Above the quantum wells is an n-type InP layer followed by a superlattice of InGaAsP and InP which is used to block only defects that are generated after the bonding process. Following the superlattice layers is another n-type InP contact layer. Finally, above the contact layer is a 15 nm thick stop each layer followed by a 500 nm sacrificial InP layer.

Fabrication of SL-QWI photonic circuits that include electroabsorption modulators is straightforward and can be divided into three distinct sections. The first fabrication section involves patterning Si waveguides into the SOI wafer, performing the quantum well intermixing process on the InP/InGaAsP wafer, and patterning shallow gratings in the InGaAsP/InP wafer.

The second fabrication section is the well established plasma assisted bonding step that has been implemented for other types of devices including evanescently coupled lasers. Following the bonding the third section involves electrically isolating various regions in the photonic circuit, including a low-K dielectric for low capacitance EAMS, and defining metal contacts for both p and n regions in the InGaAsP/InP wafer.

Patterning Waveguides: Section 1

Fabrication section 1 is outlined in FIGS. 3 and 4. First, a shallow etch is made in the SOI wafer to define waveguides using a standard CMOS process. This step is followed by a QWI process (Shown in FIG. 4) that is performed on the InGaAsP wafer. The intermixing process begins with a blanket implementation of a sacrificial InP layer at 200 C with phosphorus atoms (step 1). The implant energy and dose are selected such that the point defects generated by the implantation process are confined to the 500 nm InP buffer layer. Following the implantation, a selective wet etch using 3:1 HCl/H3PO4 is performed to remove the buffer layer down to the InGaAsP stop etch layer in regions where optical gain will be desired (step 2). The InP/InGaAsP wafer is then encapsulated in Silicon Nitride (SiNx) dielectric and subjected to a high temperature Rapid Thermal Annealing (RTA) (step 3). The RTA step activates the defects generated by the implantation step. These defects diffuse down to the quantum well (gain) regions, and cause the group V elements in the wells and harder to interdiffuse. This interdiffusion process modifies the shape of the quantum wells/gain regions, changing the standard square shape (as grown) structures into parabolic QWs. The modification of the well shape moves the lowest energy state in these wells to higher bandgaps (lower wavelengths). A more detailed discussion of this process can be found in [1]. Once the desired interdiffusion, or bandgap, has been reached, the process can be halted by removing the sacrificial InP 500 nm buffer layer. For electroabsorption modulator regions, the bandgap can be halted at 1490 nm, from a starting wavelength of 1540 nm. After removing the buffer layer above the EAM regions, the intermixing process can be continued until the desired bandgap is reached for the passive or mirror regions (1400 nm) (steps 4-6).

After the various bandgap regions have been defined, the InGaAsP wafer is patterned for gratings (steps 7-9). In the regions that have been shifted the farthest (mirror, passive), the dielectric (SiNx) mask is selectively patterned and burst windows associated with tunable sampled grating DBR lasers [3] are opened using a dielectric etch. Gratings are then defined in the burst opening using a wafer scale holographic process and etched with methane hydrogen argon plasma.

Bonding Section 2

Fabrication section 2 is described in detail [2]. The InGaAsP/InP and Si wafers are subjected to an oxygen plasma and the patterned face of the InP wafer is bonded to the patterned face of the SOI wafer. Bonding is performed under pressure and temperature for 12 hours. Though no precise alignment between the wafers is required, coarse rotational alignment is used to orient the gratings on the InP wafer orthogonal to the Si waveguides.

Electrical Isolation: Section 3

Section 3 is outlined in FIG. 5. After bonding, the p-type InP substrate is removed and InGaAsP/InP mesa regions are formed as shown in FIG. 7. After mesa definition, N-metallization is performed followed by a proton implantation step for electrical isolation and for low capacitance Electroabsorption Modulators (EAMs). The proton implantation is followed by implementation of low-K dielectrics, such as bis-benz-cyclobutene (BCB), for additional low capacitance in the EAMs. Finally, p-type metallization and n-type metallization is performed to contact p and n regions. Samples are then diced into pieces and facets are polished and anti-reflection coated for low back reflection into the integrated lasers.

An embodiment of a device that utilizes the SL-QWI integration platform is an in-plane widely tunable laser integrated with an SOA and EAM in a transmitter arrangement. The structure is shown in FIG. 6 where a widely tunable, four section sampled grating DBR laser, SOA and EAM are fabricated in a single exposed ridge architecture. Light from the laser is amplified by the SOA and fed into the EAM for data processing. Using the gratings patterned in the InP wafer allows for efficient integration of mirror regions without additional processing in the silicon wafer. The integration of the backside absorbing region in the transmitter can eliminate the possibility of back-reflections from the facet at the back mirror. The taper regions at the input and output of the tunable transponder can allow the light to be efficiently transferred from partially in the III-V region to fully in the Si region without back-reflections into the laser.

The embodiment shown in FIG. 6 is a tunable transmitter including a Widely Tunable Sampled Grating DBR laser (absorber, rear mirror, phase, gain, front mirror), Semiconductor optical amplifier and electroabsorption modulator. The gold color on the top of the device in the top view is both n and p-metalization layer as described previously. The various colors under the metal in this view are an indication of the bandgap of each region after the quantum well intermixing process. The cross sectional view shows both the Silicon (green) and InP (blue) wafer bonded together. Grey regions in the cross section indicate where proton implantation has been performed to separate various laser and modulator functionality.

Another embodiment of a monolithically integrated device using this platform is a simple photodetector and SOA fabricated on a single chip for high power pre-amplified receiver applications. The structure for such a device is shown in FIG. 8, where light from an external fiber is coupled into an SOA containing both offset and centered QWs, amplified by SOA and in turn fed to a photodetector comprising reverse biased amplifier regions. In previous approaches for such a device, separate waveguides for detector and amplifier have been employed, and high saturation powers have been achieved using a complicated structure using Avalanche Photodiodes (APD) or Uni-Traveling-Carrier (UTC) photodetectors.

In another embodiment of a device that uses the SL-QWI platform, a wavelength converter described in [4] could also a second EA modulator on the transmitter portion of the device. This second modulator can be used as a carving modulator to include re-timing functionality into the integrated wavelength converter. An outline of such a device is shown in FIG. 8.

Additional Structures

Other substrates, such as silicon without an insulator, can be used within the scope of the present invention. Silicon photonics as an integration platform is a focus of research because of the promise of low cost manufacturing for such devices. Silicon has an indirect bandgap and hence does not emit significant amounts of light when driven electrically or optically. Silicon's indirect bandgap has been a key hurdle for achieving optical gain elements. Raman lasers and amplifiers have been demonstrated, and optical gain in nanopatterned silicon have been observed, but an electrically pumped all-silicon gain element has not yet been achieved prior to the present invention.

To overcome the indirect bandgap problem, the insulator layer is used as an element of the overall structure. The insulator layer of the SOI wafer provides the optical confinement on the lower side of the waveguide.

Another solution within the scope of the present invention is to provide a waveguide layer in the III-V material instead of in the silicon layer. This is shown in FIG. 9. In this case, the silicon wafer is acting as a cladding. The III-V layer can be placed adjacent to the silicon layer as in silicon evanescent lasers. However, when integrated devices are desired, it may become necessary to etch away the absorbing quantum well layers, and then the waveguiding core is lost.

To allow for integrated III-V waveguides and silicon devices, the III-V waveguide layer can be placed between the silicon layer and the quantum well gain region, as long as the index of the III-V waveguiding layer is higher than that of silicon. Then, when the quantum well layers are etched off, the mode will still be guided, and coupling between the gain and the absorber regions and passive waveguides will remain strong. This approach is shown in FIG. 10.

Another approach would be to regrow a waveguiding layer above the quantum well layer after the etching of the quantum wells for the passive regions as shown in FIG. 11.

Another approach would be to quantum well intermix the regions where passive waveguides are desired, as shown in FIG. 12. Other intermixing approaches, such as impurity disordering, are also possible within the scope of the present invention.

Finally, the lateral confinement of the mode can come from patterning the silicon layer, patterning the III-V layers, or both, as shown in FIG. 13.

Although described with InP devices herein, other III-V structures, such as Gallium Arsenide structures, including AlGaAs, AlGaInAs, and other structures using Ga and As, as well as indium antimonide and other III-V structures are also possible within the scope of the present invention. II-VI structures, and other compound semiconductor structures and substrates, are also possible for use within the scope of the present invention.

Process Chart

FIG. 14 illustrates a process chart in accordance with one or more embodiments of the present invention.

Box 1400 illustrates etching a silicon layer on a first substrate to define waveguides in the silicon layer.

Box 1402 illustrates implanting a first dopant into a sacrificial layer on a second substrate, wherein an energy used to implant the first dopant is selected to confine point defects in the sacrificial layer.

Box 1404 illustrates selectively removing the sacrificial layer.

Box 1406 illustrates encapsulating the second substrate with a dielectric layer.

Box 1408 illustrates diffusing the defects from the sacrificial layer to a quantum well layer in the second substrate.

Box 1410 illustrates removing the sacrificial layer of the second substrate.

Box 1412 illustrates patterning the second substrate.

Box 1414 illustrates bonding the first substrate to the second substrate.

REFERENCES

The following references are incorporated by reference herein:

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CONCLUSION

In summary, embodiments of the invention provide methods for making optical devices integrated with silicon electronics.

A silicon laser intermixed integrated device in accordance with one or more embodiments of the present invention comprises a silicon-on-insulator substrate, comprising at least one waveguide in a top surface, and a compound semiconductor substrate comprising a gain layer, the compound semiconductor substrate being subjected to a quantum well intermixing process, wherein the upper surface of the compound semiconductor substrate is bonded to the top surface of the silicon-on-insulator substrate.

Such a device further optionally comprises the waveguide in the top surface being substantially orthogonal to a grating in the upper surface, electrical isolation being achieved by proton implantation, the compound semiconductor substrate comprising at least one laser that is integrated with the silicon-on-insulator substrate without individual placement of the laser, the compound semiconductor substrate further comprising at least one modulator, the compound semiconductor substrate being encapsulated in a dielectric material and annealed to interdiffuse defects into the gain layer, the integrated device being a wavelength converter integrated with an electroabsorption modulator, the integrated device comprising an optical amplifier, the integrated device being a tunable laser integrated with a semiconductor optical amplifier and an electroabsorption modulator, and the integrated device being a photodetector integrated with a semiconductor optical amplifier.

A silicon laser-quantum well intermixing integrated device in accordance with one or more embodiments of the present invention comprises a silicon substrate, comprising a top surface, and a compound semiconductor substrate comprising a quantum well layer and a waveguide layer, the compound semiconductor substrate being subjected to a quantum well intermixing process, an upper surface of the compound semiconductor substrate comprising a grating, wherein the upper surface of the compound semiconductor substrate is bonded to the top surface of the silicon substrate.

Such a device further optionally comprises the waveguide layer being substantially orthogonal to the grating, and the compound semiconductor substrate being encapsulated in a dielectric material and annealed to interdiffuse defects into the quantum well layer.

A method for making a silicon laser-quantum well intermixing integrated device in accordance with one or more embodiments of the present invention comprises etching a silicon layer on a first substrate to define waveguides in the silicon layer, implanting a first dopant into a sacrificial layer on a second substrate, wherein an energy used to implant the first dopant is selected to confine point defects in the sacrificial layer, selectively removing the sacrificial layer, encapsulating the second substrate with a dielectric layer, diffusing the defects from the sacrificial layer to a quantum well layer in the second substrate, removing the sacrificial layer of the second substrate, patterning the second substrate, and bonding the first substrate to the second substrate.

Such a method further optionally comprises diffusing the defects from the sacrificial layer to a quantum well layer in the second substrate alters the shape of at least one quantum well in the quantum well layer, removing the sacrificial layer of the second substrate stops the diffusion of the defects from the sacrificial layer to the quantum well layer, the diffusion of the defects from the sacrificial layer to the quantum well layer being stopped when a desired bandgap of the quantum well layer is reached, the first substrate being a silicon substrate, and the second substrate being a III-V substrate.

The foregoing description of the preferred embodiment of the invention has been presented for the purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Many modifications and variations are possible light of the above teaching. It is intended that the scope of the invention be limited not by this detailed description, but by the claims appended hereto which form a part of this application, and by the full range of equivalents of the appended claims. 

What is claimed is:
 1. A photonic device comprising: a silicon-on-insulator substrate comprising a silicon layer that includes a first waveguide; and a compound semiconductor structure comprising: a first layer comprising a p-type compound semiconductor; a second layer comprising an n-type compound semiconductor; and a multiple-quantum-well (MQW) layer that is between the first layer and the second layer, the MQW layer being characterized by an as-grown bandgap, the MQW layer including a first region having a first bandgap that is shifted by a first shift from the as-grown bandgap, the first shift being based on an ion-implanted layer proximate to the second layer and distal to the first layer; wherein the compound semiconductor structure and the first waveguide are bonded such that the MQW layer and the first waveguide are optically coupled and the second layer is proximate to the first waveguide; and wherein the compound semiconductor structure includes a gain region, a first mirror region, and a second mirror region, the gain region being between the first mirror region and the second mirror region, the first region including one of the gain region, the first mirror region and the second mirror region.
 2. The photonic device of claim 1, wherein the compound semiconductor structure includes a modulator region that is optically coupled with the gain region.
 3. The photonic device of claim 2, wherein the modulator region comprises an electroabsorption modulator.
 4. The photonic device of claim 2, wherein the modulator region includes a second region of the MQW layer, the second region having a second bandgap that is shifted by a second shift from the as-grown bandgap.
 5. The photonic device of claim 2, wherein the compound semiconductor structure includes a semiconductor optical amplifier (SOA), the SOA being optically coupled with each of the gain region and the modulator region.
 6. The photonic device of claim 1, wherein the compound semiconductor structure includes a semiconductor optical amplifier (SOA), the SOA being optically coupled with the gain region.
 7. The photonic device of claim 1 wherein the compound semiconductor structure further comprises a separate confined heterostructure (SCH) layer, the MQW layer being between the second layer and the SCH layer.
 8. The photonic device of claim 1 wherein the compound semiconductor structure further comprises superlattice layer that is located between the silicon layer and the MQW layer.
 9. The photonic device of claim 1 wherein the compound semiconductor structure further comprises: a first proton implanted region located between the gain region and the first mirror region; and a second proton implanted region located between the gain region and the second mirror region.
 10. The photonic device of claim 1 wherein the compound semiconductor structure further comprises a phase control region, the phase control region being located between the gain region and the first mirror region.
 11. The photonic device of claim 1 wherein the compound semiconductor structure further comprises: a third region wherein the MQW layer is characterized by the second bandgap, wherein each of the second region and third region is operative for reflecting at least a portion of the optical signal, and wherein the first region is between the second region and third region; and a fourth region wherein the MQW layer is characterized by a third bandgap, the third bandgap being shifted from the as-grown bandgap by a second shift that is based on a second period of quantum-well intermixing performed through the second layer, the third region being operative for modulating the intensity of the optical signal; wherein the first region, second region, third region, and fourth region are optically coupled.
 12. A photonic device comprising: a silicon layer that includes a first waveguide; and a compound semiconductor structure comprising: a first layer comprising a p-type compound semiconductor; a second layer comprising an n-type compound semiconductor; and a multiple-quantum-well (MQW) layer that is between the first layer and the second layer, the MQW layer being characterized by an as-grown bandgap; wherein the compound semiconductor structure and the first waveguide are bonded such that the MQW layer and the first waveguide are optically coupled and the second layer is proximate to the first waveguide; and wherein the compound semiconductor structure further includes: a first region wherein the MQW layer is characterized by a first bandgap that is equal to the as-grown bandgap, the first region being operative for providing optical gain; and a second region wherein the MQW layer is characterized by a second bandgap, the second bandgap being shifted from the as-grown bandgap by a first shift that is based on a first period of quantum-well intermixing performed through the second layer.
 13. The photonic device of claim 12, wherein the compound semiconductor structure includes a semiconductor optical amplifier (SOA), the SOA being optically coupled with at least one of the first region and second region.
 14. The photonic device of claim 12, further comprising a grating structure that is optically coupled with the first waveguide.
 15. The photonic device of claim 12, wherein the compound semiconductor structure further comprises third layer that is between the MQW layer and the second layer, the third layer comprising a compound semiconductor superlattice, and the third layer being operable for inhibiting migration of defects between the MQW layer and second layer after the compound semiconductor structure and the first waveguide are bonded.
 16. The photonic device of claim 12, wherein the compound semiconductor structure includes a semiconductor optical amplifier (SOA), the SOA being optically coupled with the gain region.
 17. The photonic device of claim 12 wherein the compound semiconductor structure further comprises a separate confined heterostructure (SCH) layer, the MQW layer being between the second layer and the SCH layer.
 18. A method comprising: (1) providing a first substrate having a compound semiconductor structure that includes: (a) a first layer comprising an p-type compound semiconductor; (b) a second layer comprising a n-type compound semiconductor; (c) an MQW layer that is between the first layer and second layer; wherein the first layer is proximate to a base substrate, and wherein the second layer is distal to the base substrate, and further wherein the MQW layer is characterized by an as-grown bandgap; and (d) a sacrificial layer that is proximate to the second layer; implanting the sacrificial layer with a first dopant to induce defects in the sacrificial layer; removing the sacrificial layer in a first region; heating the compound semiconductor structure for a first time to diffuse the defects through the second layer and into the MQW layer in a second region, wherein the bandgap of the second region is based on the first time; removing the sacrificial layer; bonding the first substrate to a second substrate having a silicon layer that includes a first waveguide, wherein the first substrate is bonded to the second substrate such that the second layer is proximate to the first waveguide and the MQW layer and first waveguide are optically coupled; removing the first substrate; forming a hybrid-silicon laser in the first region; and forming first and second mirror regions in the second region, the first region being between the first and second mirror regions.
 19. The method of claim 18 further comprising: removing the sacrificial layer in a third region, the second region comprising the third region; and heating the compound semiconductor structure for a second time to diffuse the defects through the second layer and into the MQW layer in the third region, wherein the bandgap of the third region is based on the first time and second time.
 20. The method of claim 19 further comprising forming an electroabsorption modulator in the third region. 